Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6438176 | Geochimica et Cosmochimica Acta | 2015 | 18 Pages |
Abstract
The 40Ar/39Ar technique applied to impact glass has been used to date both terrestrial and lunar impact events. The ability to utilize the 40Ar/39Ar technique rests on the assumption that impact glasses are closed to the loss of daughter product, 40Arâ, after formation. Diffusion experiments were performed on three Apollo 16 lunar impact glasses and yielded activation energies for 39Ar of â¼17 to 20 kcal molâ1 and log10(D0/a2) values of â5.2 to â6.0 sâ1. The resulting diffusion coefficients are interpreted as minimum values and the Apollo 16 glass is probably some of the least retentive of lunar glasses, as the degree of non-bridging oxygen is at one end of the range in lunar glasses. At temperatures below the glass transition temperature (i.e., â¼660 °C), the data can be explained by volume diffusion from a single diffusion domain. Modeling shows that Apollo 16 composition glass could lose significant quantities of radiogenic argon (40Arâ) (â¼90-100% over 20-40 Myr assuming a diffusion domain size (a) of 75 μm) due to diurnal temperature variations on the lunar surface, although 40Arâ loss is highly sensitive to exposure duration and effective diffusion domain size. Modeling shows that loss from transient thermal events (e.g., heating to â¼200 °C for 102 yr duration) can also cause partial resetting of apparent 40Ar/39Ar ages. In small (a = 75 μm) glasses a maximum of 50-60% of 40Arâ is lost over 4 Ga when buried to depths corresponding to temperatures of â15 °C. Results indicate that caution should be exercised in interpreting lunar impact glass 40Ar/39Ar ages, as the assumption of closed system behavior may have been violated, particularly in glasses with low fractions of non-bridging oxygen.
Related Topics
Physical Sciences and Engineering
Earth and Planetary Sciences
Geochemistry and Petrology
Authors
David J. Gombosi, Suzanne L. Baldwin, E. Bruce Watson, Timothy D. Swindle, John W. Delano, Wayne G. Roberge,