Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6457458 | Solar Energy Materials and Solar Cells | 2017 | 7 Pages |
â¢As-cut mc-Si wafer can be isotropically etched by a two-step alkali-etch process.â¢Flat wafer surface benefits homogenous nanostructure and cell's performance.â¢Mean efficiency of N-DRE Bmc-Si cells reach 18.63%, 0.6% higher than normal ones.â¢Isc and Voc voltage were improved simultaneously in N-DRE Bmc-Si solar cells.â¢High Voc of N-DRE Bmc-Si solar cells is contributed to small dark current I0.
Alkali solutions are not suitable for texturing multi-crystalline silicon (mc-Si) wafer due to the anisotropic etching. In this study, a two-step alkali-etch process is developed to form a flat surface on the wafer, which can be quickly and nearly isotropically etched by immersion in a sodium hydroxide solution, followed by a sodium hydroxide-sodium hypochlorite solution. The etching process leads to the formation of homogenous nanostructure, thereby improving the cell's repeatability and performance by simultaneously increasing its short-circuit current and open-circuit voltage.