| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6534739 | Solar Energy Materials and Solar Cells | 2016 | 6 Pages |
Abstract
CeO2 and hydrogen co-doped In2O3 (ICO:H) films deposited by ion plating with dc arc-discharge were used as a transparent conducting oxide (TCO) electrode in hydrogenated amorphous silicon (a-Si:H)/crystalline silicon (c-Si) heterojunction (SHJ) solar cells. Incorporating ICO:H instead of conventional Sn-doped In2O3 (ITO) films and hydrogenated In2O3 (IO:H) films, improved the fill factor (FF) and short-circuit current density (Jsc) simultaneously. The best SHJ cell (243.4Â cm2) containing ICO:H films had a conversion efficiency of 24.1%, open-circuit voltage of 745Â mV, Jsc of 38.8Â mA/cm2, and FF of 83.2% because of their high Hall mobility of 140Â cm2/VÂ s. We have clarified the following design principles for ICO:H films: (i) the Ce species substituted for In atoms acts as a donor and (ii) CeO2 and H decrease the residual strain and the contribution of the grain boundary scattering to carrier transport. This co-doping method can produce high conversion efficiencies in all solar cells containing TCO with resistive emitters.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Catalysis
Authors
Eiji Kobayashi, Yoshimi Watabe, Tetsuya Yamamoto, Yoichi Yamada,
