Texturization using metal catalyst wet chemical etching for multicrystalline diamond wire sawn wafer

Acidic solution texture by HF/HNO3 has been wildly used for the multicrystalline-Si (mc-Si) solar cell mass production. But, acidic texturing is difficult for the diamond wire sawn wafer, because the damage layer does not homogeneously distribute on the diamond wire sawn wafer. Metal catalyst texture (MCT) using silver nitrate (AgNO3) is effective method even though the diamond wire sawn wafer. The texture with metal catalyst reaction is spontaneously formed irrespective of the wafer surface condition. In this article, fine texture structure is demonstrated for the diamond wire sawn wafer by the MCT method, texture structure is possible to control easily by changing the immersion time in the reaction container. The cell conversion efficiency for the diamond wire sawn wafer by the MCT is as high as that for the slurry wire sawn wafer by the acidic texture. The MCT is effective method for both the slurry and diamond wire sawn wafer. The MCT method will especially become most possible alternative candidate for the diamond wire sawn wafer.