Article ID Journal Published Year Pages File Type
6592566 Chemical Engineering Science 2012 8 Pages PDF
Abstract
► Mesoporous dual layers of polyaniline supported Cu2O films have been deposited. ► Electrochemical method was employed with the LLC template. ► The band gap of mesostructure dual layers Cu2O/PANI is found to be 1.86 eV.
Keywords
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
Preview
Electrodeposition of mesoporous bilayers of polyaniline supported Cu2O semiconductor films from Lyotropic Liquid Crystalline phase
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