Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6596279 | Current Opinion in Chemical Engineering | 2016 | 6 Pages |
Abstract
Secondary ion mass spectrometry (SIMS) has joined the ranks of commonplace analytical tools for nanostructures in ways that would have been difficult to foresee even a decade ago. In particular, improvements in numerical data processing have permitted the use of SIMS in one dimension with uneven surfaces and in reconstructing compositional profiles in two and even three dimensions. These developments offer perhaps the brightest prospects for making SIMS a leading member within the select family of first-line characterization tools for nanoelectronics, nanoparticles, and polycrystalline and composite materials - as well as expanding the science base for tailoring such structures.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Edmund G Seebauer, D Eitan Barlaz,