| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 66105 | Journal of Molecular Catalysis A: Chemical | 2012 | 7 Pages |
Ni films with a thickness of 700–800 nm were deposited on carbon fiber layers using electroless deposition, and Ni films with different porosities and thicknesses were prepared by post-annealing at various temperatures (300, 500, 600, 700, 800 and 900 °C). 600 °C-annealing under atmospheric conditions resulted in formation of highly porous surface structures with a mean pore size of ∼100 nm, whereas the other samples showed less or non-porous surface structures. Surface structures and chemical properties of three selected Ni filters annealed at 300, 600 and 900 °C (a nonporous Ni filter, a highly porous one, a hollow structured one, respectively) were further studied using XRD, XPS, toluene adsorption and CO oxidation. 600 °C-annealed Ni film showed much higher reactivities for toluene adsorption and CO oxidation comparing to other non-porous surfaces.
Graphical abstractFigure optionsDownload full-size imageDownload high-quality image (274 K)Download as PowerPoint slideHighlights► Ni films were deposited on carbon fiber using electroless plating method. ► 600 °C-annealing of the Ni/carbon-fiber filter resulted in porous surface structure. ► Porous Ni surfaces showed enhanced surface area and CO oxidation reactivity.
