| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 6618156 | Electrochimica Acta | 2013 | 7 Pages |
Abstract
⺠There are three deposition methods to do the electrochromic layer (WO3 thin film) for the electrochromic device. ⺠WO3 thin films were deposited on ITO glass and silicon substrate with different gas ratios of oxygen and argon was investigated. ⺠The Raman spectra exhibited the bond of tungsten with three different deposited methods. ⺠Optical density and coloration efficiency were discussed for the electrochromic device performance. ⺠The bleached/colored ability of the cyclic voltammograms (CVs) was pulsed DC > DC > RF.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Chemical Engineering (General)
Authors
Hsi-Chao Chen, Der-Jun Jan, Chien-Han Chen, Kuo-Ting Huang,