Article ID Journal Published Year Pages File Type
6618429 Electrochimica Acta 2012 7 Pages PDF
Abstract
Etching of detrimental CuxSe phases is investigated with 5% and 0.5% (w/w) aqueous KCN. The slower 0.5% (w/w) KCN etch allows better process control, and re-annealing at 500 °C for 30 min followed by further etching significantly improved the photo-activity. However, over the large area local pinhole recombination effects are substantial. An alternative low temperature film optimisation method is proposed based on (i) KCN over-etch, (ii) hypochlorite (5%, w/w) pinhole removal (Mo etch), and (iii) a final KCN etch to give good and more uniform activity.
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
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