Article ID Journal Published Year Pages File Type
6663221 Journal of Electroanalytical Chemistry 2013 8 Pages PDF
Abstract
► Electrodeposition mechanism of nickel from sulfate base solutions. ► SEM examination to study the mechanism of nucleation and growth. ► Effect of chloride ions being adsorbed on silicon as an enhancing factor for nucleation rate. ► Hydrogen evolution influences mechanism and nucleation rate.
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
Authors
, , , , , ,