Article ID Journal Published Year Pages File Type
6663755 Journal of Electroanalytical Chemistry 2008 11 Pages PDF
Abstract
The electrooxidation of formic acid, potentially important for future fuel cells, was investigated by means of cyclic voltammetry (CV) and in situ infrared reflection absorption spectroscopy (IRRAS) both on a pure and on a copper-modified Pd(1 1 1)-electrode in sulphuric acid solutions. In situ IR spectra recorded under open-circuit conditions exhibit several vibrational bands in the carbonyl region characteristic of “free” and adsorbed formic acid as well as of decomposition intermediates. A detailed analysis of the intensity of the bands as a function of time leads to a reaction mechanism for the mere “catalytic” oxidation of formic acid at the Pd(1 1 1)/electrolyte interface. The “electro-catalytic” oxidation of formic acid under potential control starting above 0.35 V is investigated by following the evolution of carbon dioxide as a function of electrode potential. IR measurements at different but constant potentials point to an electronic structure of the solid/liquid interface in the open-circuit HCOOH/Pd(1 1 1)-H2SO4 system which resembles that at an electrode potential of about 0.4 V. Modification of the Pd(1 1 1) surface is achieved by copper deposition from a Cu2+/HCOOH/H2SO4 solution. Simultaneously, the influence of the foreign metal on the electro-catalytic oxidation of formic acid is studied in dependence on the potential scan direction. In the positive-going scan copper deposited on Pd(1 1 1) at cathodic potential inhibits the electro-catalytic oxidation of formic acid below 0.45 V by blocking catalytically active Pd sites. Conversely, during the negative-going scan the Cu2+/HCOOH/Pd(1 1 1)-H2SO4 system shows an increased oxidation activity between 0.6 V and 0.2 V due to a direct redox reaction between copper ions and formic acid. The amount of copper deposited on the surface was determined by ex situ Auger Electron Spectroscopy after a contamination free sample transfer into UHV.
Related Topics
Physical Sciences and Engineering Chemical Engineering Chemical Engineering (General)
Authors
, , ,