Design of an ICRF system for plasma-wall interactions and RF plasma production studies on TOMAS

The sensitivity of the matching system to uncertainties on plasma loading and capacitance values is notably addressed. With a choice of three variable capacitors we show that the system can cope with such uncertainties. We also demonstrate that the system can cope as well with the high reflected power levels during the short breakdown phase of the RF discharge, but at the cost of a significantly reduced coupled power.