Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
675090 | Thermochimica Acta | 2009 | 4 Pages |
Abstract
We report on nanocalorimetric measurements of 50 nm thick toluene films at heating rates spanning 600 to 8 × 104 K/s. The films are grown from the vapour at 90 K directly onto the nanocalorimetric cell. The kinetic and thermodynamic stability of as-deposited films is higher than the stability of films cooled from the supercooled liquid at 2000 K/s. We also show that at those heating rates, the calorimetric Tg does not correlate with the relaxation time obtained by dielectric spectroscopy.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Fluid Flow and Transfer Processes
Authors
E. León-Gutierrez, G. Garcia, M.T. Clavaguera-Mora, J. Rodríguez-Viejo,