Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
68205 | Journal of Molecular Catalysis A: Chemical | 2008 | 7 Pages |
Etch hillocks formation was studied experimentally and modeled using the Monte Carlo method. Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a one- and two-dimensional substrate models. Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(1 0 0) are presented. The steady-state morphologies are analyzed and the hillock size distributions determined. The mechanisms responsible for the steady-state morphologies are described.
Graphical abstractEtch hillocks formation was studied experimentally and modeled using the Monte Carlo method. Simulations were used to explore the consequences of site-dependent detachment probabilities on surface morphology for a one- and two-dimensional substrate models. Comparison with pyramidal etch hillocks that are regularly observed in anisotropic etching of Si(1 0 0) are presented. The steady-state morphologies are analyzed and the hillock size distributions determined. The mechanisms responsible for the steady-state morphologies are described. Figure optionsDownload full-size imageDownload as PowerPoint slide