An XPS investigation of the interaction mechanism between AlEt3 and TiCl4 supported on sputtered native SiOx layer

TiCl4 supported on silicon oxide or magnesium halides is widely used as catalyst for olefin polymerization from the gas phase. These catalysts are usually activated with organoaluminum compounds such as triethylaluminum (AlEt3). In the present study, the interaction mechanism between AlEt3 and titanium chloride supported on a SiOx layer was investigated using X-ray photoelectron spectroscopy (XPS). A flat conductive Si wafer covered with a thin native SiOx layer, was used as support, in order to eliminate electrostatic charging effects during the XPS measurements and allow a more reliable identification of surface chemical species. It was found that the TiCl4 vapors react with the sputtered oxide layer mainly through isolated surface Si–OH species leading to formation of Si–O–TiCl3. There was no evidence of Ti reduction after the interaction with AlEt3 vapors but only a small downward BE shift of the Ti 2p3/2 peak. This behavior was attributed to the effect of alkylation of the titanium oxychloride species. On the basis of the present results it is proposed that the alkylation takes place by means of surface complex formation with AlEtx that may or may not be chemically bonded on the SiOx surface.

Graphical abstractThe interaction mechanism between AlEt3 and titanium chloride supported on a flat SiOx layer was investigated using X-ray photoelectron spectroscopy (XPS). TiCl4 vapors react with the oxide layer mainly through isolated silanols forming Si–O–TiCl3. Alkylation of the titanium oxychloride surface species takes place by means of complex formation with AlEtx that may or may not be chemically bonded on the SiOx surface. Figure optionsDownload full-size imageDownload as PowerPoint slide