Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
6981596 | Colloids and Surfaces B: Biointerfaces | 2015 | 7 Pages |
Abstract
- Si-incorporated TiO2 nanopores films were prepared using anodization and silicon plasma immersion ion implantation.
- The concentration and depth of silicon in TiO2 nanopores films increased with the duration time of implantation.
- Si-incorporated TiO2 nanopores films exhibited good hydrophilicity and cytocompatibility.
Keywords
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Colloid and Surface Chemistry
Authors
Shi Qian, Xuanyong Liu,