| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7062231 | Thermochimica Acta | 2016 | 7 Pages |
Abstract
- Nonisothermal thermal oxidation of mesoporous silicon is examined with STA.
- Model-free and model-fitting methods are used to the oxidation kinetic analysis.
- The oxidation has two steps. It started by surface groups by Avrami-Erofeev model.
- Second is oxidation controlled by 3D diffusion of oxygen through the silica layer.
Related Topics
Physical Sciences and Engineering
Chemical Engineering
Fluid Flow and Transfer Processes
Authors
Ali Ghafarinazari, Emanuele Zera, Anna Lion, Marina Scarpa, Gian Domenico Sorarù, Gino Mariotto, Nicola Daldosso,