Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7117639 | Materials Science in Semiconductor Processing | 2018 | 5 Pages |
Abstract
The anticorrosive property of yttrium oxide was evaluated using chlorine trifluoride gas. After the exposure to chlorine trifluoride gas at room temperature for the total time longer than 1000â¯min, the yttrium oxide film, formed on a quartz glass surface, did not show any etching behavior and surface morphology change, while the non-coated quartz glass showed a rough surface with the etching depth of nearly 0.1â¯mm. Because yttrium oxide had no chemical reaction with chlorine trifluoride gas at temperatures less than 300â¯Â°C, yttrium oxide film is expected to protect the quartz glass from etching by chlorine trifluoride gas at room temperature for a significantly long time.
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Authors
Ryohei Kawasaki, Yasuhiro Umetsu, Keisuke Kurashima, Kohei Shioda, Asumi Hirooka, Hitoshi Habuka,