Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7118068 | Materials Science in Semiconductor Processing | 2018 | 6 Pages |
Abstract
Simple technique of formation of “black silicon” using wet chemical etching of crystalline Si wafers with SiGe self-assembled islands is proposed. The main idea consists of the utilization of SiGe islands as a mask for wet anisotropic etching of Si in alkali-based solution at the first etching stage and further removal of SiGe residuals by etching in a HF:H2O2:CH3COOH mixture at the second etching stage. Initial samples were the crystalline Si wafers with SiGe islands formed on them by deposition of 2.5-14 nm of Ge at 800 °C. After the two above-mentioned etching steps a submicron relief on a Si surface was formed. Investigation of optical properties of fabricated structures revealed significant decrease of reflection (AM 1.5 G weighted reflection ~2-3%) and increase of absorption in the wavelength range of 500-1200 nm. Due to the very small amount of Si removal (<0.5 µm), utilization of standard chemicals for Si-based solar cell technology and potential suitability for usage in large-scale manufacturing the proposed technique is promising for increasing of efficiency of thin wafers crystalline Si solar cell.
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Authors
D.V. Yurasov, A.V. Novikov, M.V. Shaleev, N.A. Baidakova, E.E. Morozova, E.V. Skorokhodov, Y. Ota, A. Hombe, Y. Kurokawa, N. Usami,