Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7119722 | Materials Science in Semiconductor Processing | 2014 | 6 Pages |
Abstract
Liquid phase deposition (LPD) technique was developed to prepare zinc oxide (ZnO) thin film with high photoelectrochemical activity. The field emission scanning electron microscopy (FESEM) and X-ray diffraction (XRD) characterization showed that the deposited film was composed of many stick microcrystalline structured ZnO. The photoelectrochemical property of LPD film was analyzed by chronoamperometry and electrochemical impedance spectroscopy (EIS) under UV-light excitation. Using the LPD ZnO film as photoanode, the removal of p-nitrophenol (PNP) was studied by photoelectrocatalytic (PEC) oxidation technique. The influencing factors such as initial concentration of PNP, pH and bias potential were systematically investigated. Under optimized conditions, PNP was effectively degraded by photoelectrocatalysis on the LPD ZnO film.
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Mingming Fan, Changzhu Yang, Wenhong Pu, Jingdong Zhang,