Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7130700 | Optics & Laser Technology | 2013 | 5 Pages |
Abstract
High reflection mirror for 800Â nm broadband pulse compression grating was fabricated by electron beam evaporation using three dielectrics (Ta2O5/SiO2/HfO2). It has more than 99% reflectance with bandwidth larger than 160Â nm around wavelength of 800Â nm and 84.3% transmission at the exposure wavelength of 413Â nm. Laser-induced damage behaviors of the mirror were investigated by 800Â nm TE polarization laser with pulse width Ïp of 40-100Â fs. The laser damage threshold of the mirror observes a fitting scaling law of Ïp0.29. The damage characters and near field distribution consistently indicated that the initial damage of the mirror was ascribed to nonlinear ionization in the zone position of electric field intensity maximum. The experimental threshold can be fitted with a model based on electron production taking into account photoionization and avalanche ionization. The mirrors with good spectral properties and high laser damage threshold provide a solid base for fabricating 800Â nm pulse compression gratings.
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Authors
Fanyu Kong, Shunli Chen, Yunxia Jin, Shijie Liu, Heyuan Guan, Ying Du, Hongbo He,