Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7150345 | Solid-State Electronics | 2018 | 7 Pages |
Abstract
The mechanism of reverse gate leakage current of AlGaN/GaN HEMTs with two different surface treatment methods are studied by using C-V, temperature dependent I-V and theoretical analysis. At the lower reverse bias region (VRâ¯>ââ¯3.5â¯V), the dominant leakage current mechanism of the device with N2 plasma surface treatment is the Poole-Frenkel emission current (PF), and Trap-Assisted Tunneling current (TAT) is the principal leakage current of the device which treated by HCl:H2O solution. At the higher reverse bias region (VRâ¯<ââ¯3.5â¯V), both of the two samples show good agreement with the surface leakage mechanism. The leakage current of the device with N2 plasma surface treatment is one order of magnitude smaller than the device which treated by HCl:H2O solution. This is due to the recovery of Ga-N bond in N2 plasma surface treatment together with the reduction of the shallow traps in post-gate annealing (PGA) process. The measured results agree well with the theoretical calculations and demonstrate N2 plasma surface treatment can reduce the reverse leakage current of the AlGaN/GaN HEMTs.
Related Topics
Physical Sciences and Engineering
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Electrical and Electronic Engineering
Authors
Hui Liu, Zongjing Zhang, Weijun Luo,