Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7150597 | Solid-State Electronics | 2018 | 20 Pages |
Abstract
In this paper, SONOS-type flash memory device with highly improved charge-trapping efficiency is suggested by using silicon nanocrystals (Si-NCs) embedded in silicon nitride (SiNX) charge trapping layer. The Si-NCs were in-situ grown by PECVD without additional post annealing process. The fabricated device shows high program/erase speed and retention property which is suitable for multi-level cell (MLC) application. Excellent performance and reliability for MLC are demonstrated with large memory window of â¼8.5 V and superior retention characteristics of 7% charge loss for 10 years. High resolution transmission electron microscopy image confirms the Si-NC formation and the size is around 1-2 nm which can be verified again in X-ray photoelectron spectroscopy (XPS) where pure Si bonds increase. Besides, XPS analysis implies that more nitrogen atoms make stable bonds at the regular lattice point. Photoluminescence spectra results also illustrate that Si-NCs formation in SiNx is an effective method to form deep trap states.
Keywords
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Jae-Gab Lim, Seung-Dong Yang, Ho-Jin Yun, Jun-Kyo Jung, Jung-Hyun Park, Chan Lim, Gyu-seok Cho, Seong-gye Park, Chul Huh, Hi-Deok Lee, Ga-Won Lee,