Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7150792 | Solid-State Electronics | 2016 | 6 Pages |
Abstract
The junctionless field-effect transistors (JLFETs) have shown potential to scale down in sub-10 nm regime due to simplified fabrication process and less short-channel effects (SCEs), however, sensitivity towards process parameter variation is a major concern. Therefore, in this paper, sensitivity towards temperature variation of recently proposed dopingless (DL) double-gate field-effect transistor (DGFET) and JL-DGFET is reported. Different digital and analog performance metrics were considered and compared for both devices of similar geometries. We observed that the drive current of DL-DGFET decreases with temperature, while, it increases in JL-DGFET because both devices are affected by different scattering mechanisms at higher temperature. The variation in ION and IOFF in DL-DGFET are only 0.095 μA/K and 0.2 nA/K, respectively, while, in JL-DGFET the changes are 0.25 μA/K and 0.34 nA/K, respectively, above room temperature. Below room temperature, it was found that the incomplete ionization effect in JL-DGFET severely affects the drive current, however, DL-DGFET remains unaffected. Hence, the proposed DL-DGFET is less sensitive towards temperature variation and can be employed for cryogenics to high temperature applications.
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Engineering
Electrical and Electronic Engineering
Authors
Vishwas Shrivastava, Anup Kumar, Chitrakant Sahu, Jawar Singh,