| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7176757 | Journal of Materials Processing Technology | 2016 | 7 Pages |
Abstract
Deep X-ray lithography with synchrotron radiation can be successfully used in fabrication of high-aspect-ratio microstructures (HARMs) micrometers up to several millimetres high. As such microstructures are often mechanically unstable, a supporting layer incorporated into a micropattern, was developed and studied.
Related Topics
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Engineering
Industrial and Manufacturing Engineering
Authors
Vladimir Nazmov, Elena Reznikova, Juergen Mohr, Anja Voigt,