| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7180372 | Precision Engineering | 2018 | 4 Pages |
Abstract
In this study, a figure correction method employing ion beam sputtering deposition was developed. The sputtering target is placed inside the ellipsoidal mirror. Then, a cylindrical tube with a small aperture is inserted inside the mirror to realize selective deposition. The figure accuracy of an ellipsoidal mirror is improved even when its diameter is less than 10â¯mm. This figure correction system can also be applied to various axisymmetric devices with a small diameter.
Related Topics
Physical Sciences and Engineering
Engineering
Industrial and Manufacturing Engineering
Authors
Shunya Yokomae, Hiroto Motoyama, Hidekazu Mimura,