Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7180509 | Precision Engineering | 2018 | 4 Pages |
Abstract
A local processing method based on sputtering deposition for fabricating microstructure is described. Pinholes (Ï50, 100, and 200â¯Î¼m) are used as a shadow mask to narrow the deposition area. The processing properties can be predicted by a simple numerical simulation. Using this method, the fabrication of an arbitrarily curved surface was demonstrated by controlling the position of the deposition area. The spatial frequency of the figured surface was evaluated to be 100â¯Î¼m with nanometer-level thickness controllability. In this paper, we introduce the configuration of the apparatus, experimental results, and a numerical simulation of this method.
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Authors
Hiroto Motoyama, Mitsuru Nagayama, Hidekazu Mimura,