Differential deposition for producing microstructure

A local processing method based on sputtering deposition for fabricating microstructure is described. Pinholes (φ50, 100, and 200 μm) are used as a shadow mask to narrow the deposition area. The processing properties can be predicted by a simple numerical simulation. Using this method, the fabrication of an arbitrarily curved surface was demonstrated by controlling the position of the deposition area. The spatial frequency of the figured surface was evaluated to be 100 μm with nanometer-level thickness controllability. In this paper, we introduce the configuration of the apparatus, experimental results, and a numerical simulation of this method.