| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7219860 | Materials & Design | 2016 | 6 Pages |
Abstract
Typical HRTEM image (a) and simulated image (b) of the unannealed epitaxial LSCO film. The inset in (a) shows intensity profiles for the corresponding lines. The simulation conditions are Îf = â 60.0 nm and t = 29.9 nm. Typical HRTEM image (c) and simulated image (d) of the vacuum-annealed epitaxial LSCO film. The inset in (c) shows intensity profiles for the corresponding lines; The simulation conditions are Îf = â 73.0 nm and t = 16.8 nm.217
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Authors
Bin Liu, Guiju Liu, Honglei Feng, Chao Wang, Huaiwen Yang, Yiqian Wang,