Article ID Journal Published Year Pages File Type
727997 Materials Science in Semiconductor Processing 2016 8 Pages PDF
Abstract

This paper presents a detailed study on the sensitivity and selectivity of α-Fe2O3 thin films produced by deposition of Fe and post-deposition annealed at two temperatures of 600 °C and 800 °C with flow of oxygen for application as a sensor for toxic gases including CO, H2S, NH3 and NO2 and alcohols such as C3H7OH, CH3OH, and C2H5OH. The crystallographic structure of the samples was studied by X-ray diffraction (XRD) method while an atomic force microscope (AFM) was employed for surface morphology investigation. The electrical response of the films was measured while they were exposed to various toxic gases and alcohols in the temperature range of 50–300 °C. The sample annealed at higher temperature showed higher response for different gases and alcohols tested in this work which can be due to the higher resistance of this sample. Results also indicated that the α-Fe2O3 thin films show higher selectivity to NO2 gas relative to the other gases and alcohols while the best sensitivity is obtained at 200 °C. The α-Fe2O3 thin film post-deposition annealed at 800 °C also showed a good stability and reproducibility and a detection limit of 10 ppm for NO2 gas at the operating temperature of 200 °C.

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