Optimization of spray deposition parameters for the formation of single-phase tin sulfide thin films

Thin films of tin sulfide were deposited onto glass substrates by pyrolytic decomposition using stannous chloride and thiourea as precursors. The properties of thin films based on deposition parameters such as substrate temperature (Ts), molarity of precursor solution (M) and spray rates (R) were studied. The deposited films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), UV–vis spectroscopy and Hall Effect measurements. The XRD patterns of the films exhibited polycrystalline nature with orthorhombic crystal structure. The crystallite size varied from 30 to 107 nm with the change of deposition parameters. The band gap, electrical resistivity values and the type of conductivity with respect to deposition parameters were also observed.