Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
730778 | Measurement | 2006 | 4 Pages |
Abstract
The electric field due to a strong capacitive coupling between the induction coil and the walls of the plasma chamber is quite large despite the discharge being in the H-mode in N2 and H2 gases. And as such, this field will interfere with the measurement of the magnetic field thus causing a high degree of measurement error. This paper hence describes the use of a centre-tapped coiled magnetic probe for the measurement of magnetic field profiles in 1-D in the low frequency RF inductively coupled plasma source. From these profiles, an independent method to determine the average electron density is also shown.
Keywords
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Physical Sciences and Engineering
Engineering
Control and Systems Engineering
Authors
Chandan Kumar Chakrabarty,