| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 734698 | Optics & Laser Technology | 2007 | 4 Pages |
Abstract
A novel method for measuring the coma of a lithographic projection system is proposed and the principle of the method is described. By utilizing mirror-symmetry marks, the adverse effects of axial aberrations on the coma measurement are avoided. Experimental results demonstrated that the method has high accuracy. Compared with TAMIS, the conventional technique used for coma measurement, the method is more reliable because the influences of the process factors on the lateral displacements have been considered.
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Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
Dongqing Zhang, Xiangzhao Wang, Weijie Shi, Fan Wang,