Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
735771 | Optics and Lasers in Engineering | 2006 | 17 Pages |
A large number of plane wave holograms were recorded in Agfa-Gevaert 8E75HD holographic plates, at a wide range of bias exposures and fringe visibilities. The plates were processed by various combinations of developers (AAC, Pyrogallol and Catechol) and bleaching agents (R-9 and EDTA). The phase gratings were studied by phase-contrast microscopy, using a high-power immersion (100×) objective. The phase-contrast photomicrographs were Fourier analysed. Thus, first-, second-, and third-order modulations of the refractive index as a function of bias exposure and visibility of the recording interference pattern could be determined. The ratio of the amplitudes of higher-order modulations to that of the first-order can serve as a measure of the nonlinearity of the holographic recording.