Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7376383 | Physica A: Statistical Mechanics and its Applications | 2018 | 9 Pages |
Abstract
Our numerical results show that the diffusion mechanism is described, depending on the structure of the potential, either by a simple jump diffusion process with jump length close to the lattice constant a or by a combination of a jump diffusion model with jump length close to lattice constant a and a liquid-like motion inside the unit cell. It shows also that, for different friction regimes and various potential shapes, the friction attenuates the diffusion mechanism. It is found that, in the high friction regime, the diffusion process is more important through a deformed substrate than through a non-deformed one.
Related Topics
Physical Sciences and Engineering
Mathematics
Mathematical Physics
Authors
Lahcen Arfa, Mehdi Ouahmane, Lahcen El Arroum,