Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
738720 | Sensors and Actuators A: Physical | 2008 | 6 Pages |
Abstract
A novel micromachined X-ray collector using anisotropically etched Si(1 1 1) side walls as X-ray mirrors for future astronomical missions is reported. The collector was designed to converge a Ï 100 mm parallel X-ray beam into a Ï 4 mm focus. In order to obtain smooth Si(1 1 1) side walls, dynashock-type ultrasonic waves were added during the anisotropic KOH etching. The surface roughness on the order of nm or less was achieved. The sidewalls or the X-ray mirrors were diced from the wafer as mirror chips and then adhered to a mount formed by deep reactive ion etching. The first light image was successfully obtained at Al Kα 1.49 keV in a ISAS 30 m-long X-ray beam line.
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Authors
Yuichiro Ezoe, Masaki Koshiishi, Makoto Mita, Yoshitomo Maeda, Kazuhisa Mitsuda, Takeyuki Osawa, Masaki Suzuki, Akio Hoshino, Yoshitaka Ishisaki, Takayuki Takano, Ryutaro Maeda,