Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
748777 | Solid-State Electronics | 2009 | 5 Pages |
Abstract
The charge transport mechanism in amorphous silicon nitride, Si3N4, was experimentally examined to compare measured data with theoretical calculations made within the Frenkel model and the multi-phonon model of trap ionization. A good agreement between the experimental data and theoretical predictions could be achieved assuming the multi-phonon mechanism to be in effect. The widely accepted Frenkel model, although capable of explaining the measured data, fails to yield realistic values of the electron tunnel mass and attempt-to-escape factor.
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Engineering
Electrical and Electronic Engineering
Authors
A.V. Vishnyakov, Yu.N. Novikov, V.A. Gritsenko, K.A. Nasyrov,