Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
749156 | Solid-State Electronics | 2008 | 5 Pages |
Abstract
In this work, double-gated field effect transistors manufactured from monolayer graphene are investigated. Conventional top–down CMOS-compatible processes are applied except for graphene deposition by manual exfoliation. Carrier mobilities in single- and double-gated graphene field effect transistors are compared. Even in double-gated graphene FETs, the carrier mobility exceeds the universal mobility of silicon over nearly the entire measured range. At comparable dimensions, reported mobilities for ultra-thin body silicon-on-insulator MOSFETs cannot compete with graphene FET values.
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Authors
M.C. Lemme, T.J. Echtermeyer, M. Baus, B.N. Szafranek, J. Bolten, M. Schmidt, T. Wahlbrink, H. Kurz,