Article ID Journal Published Year Pages File Type
749156 Solid-State Electronics 2008 5 Pages PDF
Abstract

In this work, double-gated field effect transistors manufactured from monolayer graphene are investigated. Conventional top–down CMOS-compatible processes are applied except for graphene deposition by manual exfoliation. Carrier mobilities in single- and double-gated graphene field effect transistors are compared. Even in double-gated graphene FETs, the carrier mobility exceeds the universal mobility of silicon over nearly the entire measured range. At comparable dimensions, reported mobilities for ultra-thin body silicon-on-insulator MOSFETs cannot compete with graphene FET values.

Related Topics
Physical Sciences and Engineering Engineering Electrical and Electronic Engineering
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