Article ID Journal Published Year Pages File Type
749347 Solid-State Electronics 2007 8 Pages PDF
Abstract

For the first time, threshold voltage matching was measured on multiple gate transistors, and particularly on Gate-All-Around transistors (GAA) with both doped and undoped channels. Good matching performance is demonstrated on doped channel transistors, thanks to the absence of pocket nor halo implants. But most of all, it is shown that suppressing the channel doping allows to drastically reduce the dopant induced fluctuations contribution and provides an AVtAVt parameter as low as 1.4 mV μm, which is one of the best reported result on MOS transistors.

Related Topics
Physical Sciences and Engineering Engineering Electrical and Electronic Engineering
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