A new process for fabricating tip-shaped polymer microstructure array with patterned metallic coatings

In this paper, we present a new process for fabricating tip-shaped polymer microstructure array coated by patterned metal layer. This new process involves three techniques including: micro-molding, patterned metal layer transfer, and electrochemical-based sacrificial layer. As we know, it is very difficult to remove the extra photoresist (PR) in the concave areas in traditional micro-fabrication technology, which hinders patterning metal layers on three-dimensional (3D) microstructures. The electrochemical-based sacrificial layer technique can effectively resolve this problem, which is verified by scanning electron microscopy (SEM) characterization. Comparative study between the 3D metal-coated polyimide microstructures fabricated with and without the electrochemical-based sacrificial layer step is also performed and SEM images proved the effect of the presented process. The applicability of the developed process is also demonstrated with the successful fabrication of a pyramid-shaped polyimide microelectrodes array for neural stimulation.