Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
753304 | Solid-State Electronics | 2009 | 7 Pages |
Abstract
With the constant-matrix-element approach we have calculated the impact ionization (II) rates for uniaxially/biaxially strained Si and biaxially strained SiGe. Energy and momentum are exactly conserved during the calculation of the six-dimensional integral in k-space over four conduction and three valence bands. The wave-vector space is discretized with a very fine grid with a spacing of up to 140(2π/a), where a is the lattice constant. II coefficient and quantum yield for relaxed Si, strained Si and strained SiGe are calculated through full-band Monte Carlo simulations. Good agreement between simulation and experimental data for relaxed Si is obtained.
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Authors
Thanh Viet Dinh, Christoph Jungemann,