Analytical model of short-channel gate enclosed transistors using Green functions

Enclosed-layout transistors fabricated in standard CMOS processes are known to offer a natural robustness against radiation effects, a characteristic which is boosted in submicron technologies due to the reduction of the oxide thickness. In this paper, a thorough analytical I–V model of short-channel polygonal enclosed-layout transistors is proposed, addressing the issues of drain-induced barrier lowering and threshold voltage roll-off due to short-channel effects. Experimental data is reported, showing good agreement with the theoretical model.