Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
753443 | Solid-State Electronics | 2008 | 10 Pages |
Abstract
We have fabricated and tested the performance of sub-50 nm gate nMOSFETs to assess their suitability for mixed signal applications in the super high frequency (SHF) band, i.e. 3–30 GHz. For a 30 nm × 40 μm × 2 device, we found fT = 465 GHz at Vds = 2 V, Vg = 0.67 V, which is the highest cut-off frequency reported for a MOSFET produced on bulk silicon substrate so far. However, our measurements of fmax and noise figure indicate that parasitics impose limitations on SHF operation. We also present a high frequency ac model appropriate to sub-50 nm gate length nanotransistors, which incorporates the effects of the parasitics. The model accurately accounts for measurements of the S- and Y-parameters in the frequency range from 1 to 50 GHz.
Keywords
Related Topics
Physical Sciences and Engineering
Engineering
Electrical and Electronic Engineering
Authors
V. Dimitrov, J.B. Heng, K. Timp, O. Dimauro, R. Chan, M. Hafez, J. Feng, T. Sorsch, W. Mansfield, J. Miner, A. Kornblit, F. Klemens, J. Bower, R. Cirelli, E.J. Ferry, A. Taylor, M. Feng, G. Timp,