| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 763056 | Computers & Fluids | 2009 | 10 Pages |
Abstract
The calculation results for a direct-flow chemical vapor deposition (CVD) reactor model are presented. Chemical condensation is considered at a small volume fraction of the dispersed phase. Phase formation stages are simulated numerically for various values of the Damköehler number over a large time interval. The calculations made it possible to identify the structures of solid-phase nucleus growth on the channel wall and in the two-phase mixture flow.
Related Topics
Physical Sciences and Engineering
Engineering
Computational Mechanics
Authors
Andrey A. Markov,