Article ID Journal Published Year Pages File Type
7674703 Spectrochimica Acta Part B: Atomic Spectroscopy 2014 8 Pages PDF
Abstract
Silicon wafers implanted with Arsenic at different implantation energies were measured by XRR and GIXRF using a combined, simultaneous measurement and data evaluation procedure. The data were processed using a self-developed software package (JGIXA), designed for simultaneous fitting of GIXRF and XRR data. The results were compared with depth profiles obtained by Secondary Ion Mass Spectrometry (SIMS).
Related Topics
Physical Sciences and Engineering Chemistry Analytical Chemistry
Authors
, , , , , , ,