| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7683557 | Talanta | 2013 | 4 Pages |
Abstract
⺠Efficient vapor generation of osmium is achieved by plasma induced vapor generation. ⺠The proposed osmium vapor generation method eliminates the use of any oxidizing agent. ⺠The oxidation process is rapid.
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Zhenli Zhu, Chunying Huang, Qian He, Qing Xiao, Zhifu Liu, Suicheng Zhang, Shenghong Hu,