| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7686704 | Talanta | 2011 | 7 Pages |
Abstract
⺠We demonstrated the formation of Np(III) via Np(IV) reduction by Cr(II). ⺠The high purity separation of Np(IV) from U(IV) on TEVA resin was possible. ⺠Np(III) is strongly retained on DGA resin. ⺠Cr(III) impurities are removed using 9 M HCl on both resins.
Related Topics
Physical Sciences and Engineering
Chemistry
Analytical Chemistry
Authors
Nicolas Guérin, Kenny Nadeau, Dominic Larivière,