Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7748215 | Coordination Chemistry Reviews | 2013 | 17 Pages |
Abstract
- Energy-enhanced ALD allows for a wider choice of precursors.
- More stable precursors allow for higher deposition temperatures to be reached.
- Energy-enhanced ALD enables low-temperature, and even room-temperature, ALD.
- Good to fair films can be deposited at room temperature with energy-enhanced ALD.
Keywords
CPXη5-pentamethylcyclopentadienylFourier transform infrared (spectroscopy)CpmETrimethylaluminiumPlasma-enhanced ALDMBEEADsIPRTHDtBuCCPTMARTPTTIPICPGPCCp*DFTALDMolecular beam epitaxyRoom temperatureAtomic layer depositionFT-IREnthalpy of adsorptionRadio-frequencyDensity functional theoryInductively-coupled plasmaPrecursors
Related Topics
Physical Sciences and Engineering
Chemistry
Inorganic Chemistry
Authors
S.E. Potts, W.M.M. Kessels,