Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
781230 | International Journal of Machine Tools and Manufacture | 2007 | 10 Pages |
Abstract
This paper investigates the material removal mechanisms of PCD using the dynamic friction polishing technique. Scanning electron microscopy, energy dispersive X-ray, X-ray diffraction and Raman spectroscopy were used to identify the mechanisms by analyzing the specimen surfaces and debris produced by polishing. It was found that the material removal occurred in a rather complex way, which can be a chemo-mechanical process, diffusion, oxidization and evaporation, or their combinations.
Related Topics
Physical Sciences and Engineering
Engineering
Industrial and Manufacturing Engineering
Authors
Y. Chen, L.C. Zhang, J.A. Arsecularatne,