Article ID | Journal | Published Year | Pages | File Type |
---|---|---|---|---|
7832619 | Acta Physico-Chimica Sinica | 2006 | 5 Pages |
Abstract
Two new methods were developed for characterizing the kinetics of the complex and oxidation process of the thin films by using transmission spectrum and sheet resistance. Ag/TCNQ (7,7,8,8-tetracyanoquinodimethane) bilayer films and copper films were prepared on glass substrates by vacuum evaporation. The complexation kinetics of Ag/TCNQ bilayer thin films was studied via transmission spectrum. The oxidation kinetics of the copper thin films was studied via sheet resistance, which increased during the process. The results suggested that the two methods can be used to characterize the kinetics of the reaction process of thin films.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Cheng Zhong, Yiming Jiang, Yufeng Luo, Jiaxing Liao, Weiwei Wu, Jin Li,