| Article ID | Journal | Published Year | Pages | File Type |
|---|---|---|---|---|
| 7834454 | Applied Surface Science | 2018 | 6 Pages |
Abstract
Titanium deuteride thin films have been manufactured under different conditions specified by deuterium gas pressure, substrate temperature and time. The films were characterized by different techniques to evaluate the deuterium content and the homogeneity of such films. Samples with different concentrations of deuterium, including non deuterated samples, were irradiated with a 150â¯keV proton beam. Both deposits, pristine and irradiated, were characterized by optical profilometry and scanning electron microscopy.
Keywords
Related Topics
Physical Sciences and Engineering
Chemistry
Physical and Theoretical Chemistry
Authors
Manuel Suarez Anzorena, Alma A. Bertolo, Leonardo Gagetti, Pedro A. Gaviola, Mariela F. del Grosso, Andrés J. Kreiner,